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Device for oxidizing a surface, notably a silicon wafer surface, comprises a point or linear heat source moving along a precise crystallographic direction, and a rotary support table to facilitate orientation
Device for oxidizing a surface, notably a silicon wafer surface, comprises a point or linear heat source moving along a precise crystallographic direction, and a rotary support table to facilitate orientation
A device for the oxidation of surfaces, notably of silicon surfaces, comprises a point or linear heat source (1 and 2), mobile with respect to the surface (4) to be oxidized along a precise crystallographic direction. The support table (3) for the surface to be oxidized is rotary to facilitate orientation of the surface.
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