首页> 外国专利> Radio-frequency microelectronic component and manufacturing method, comprises an inductive element placed on an insulator zone traversing the substrate and an insulated feedthrough

Radio-frequency microelectronic component and manufacturing method, comprises an inductive element placed on an insulator zone traversing the substrate and an insulated feedthrough

机译:射频微电子元件及其制造方法,包括放置在横穿基板的绝缘体区域上的感应元件和绝缘馈通

摘要

The component comprises a semiconductor substrate (1), an inductive element (2) placed on an insulator zone (4) traversing the substrate, and an electric connection feedthrough (5) face of the substrate is greater than the dimensions of the inductive element (2) in order to avoid inductive losses in conductor or semiconductor material. The insulator zone (4) and the insulator ring zone (6) can be implemented at the same steps of the manufacturing method. The semiconductor substrate (1) is of silicon, and the substrate comprises at least one doped zone forming an active element. The feedthrough (5) allows an interconnection between the front face and the rear face of the substrate, and an insulator layer (8) on the rear face of the substrate. The insulator layers (7,8) insulate electrically the substrate from the contact terminals (9) of the feedthrough (5). The insulator layer (7) also insulates electrically the substrate from a resistor (10) and a capacitor (11). The component comprises at least one electric connection between the substrate and an electric ground, and at least one electric connection between the substrate and an element placed on the substrate. A method (claimed) comprises the steps of making cavities in the substrate of depth lesser than the thickness of the substrate, the metallization of cavities for the feedthroughs, filling of cavities with a dielectric material, and removing the substrate thickness from the rear face sufficient to uncover the dielectric material in the cavities.
机译:该组件包括半导体衬底(1),放置在横穿衬底的绝缘体区域(4)上的感应元件(2)和衬底的电连接馈通(5)面大于感应元件的尺寸( 2)为了避免导体或半导体材料中的电感损耗。绝缘体区域(4)和绝缘体环区域(6)可以在制造方法的相同步骤中实现。半导体衬底(1)由硅制成,并且该衬底包括形成有源元件的至少一个掺杂区。穿通部(5)允许基板的正面和背面之间的互连以及基板的背面上的绝缘体层(8)。绝缘层(7,8)使基板与穿通线(5)的接触端子(9)电绝缘。绝缘体层(7)还使衬底与电阻器(10)和电容器(11)电绝缘。该部件包括在基板和电接地之间的至少一个电连接,以及在基板和放置在基板上的元件之间的至少一个电连接。一种方法(要求保护的)包括以下步骤:在衬底中制造深度小于衬底厚度的腔;金属化用于馈通的腔;用介电材料填充腔;以及从背面充分去除衬底厚度露出空腔中的介电材料。

著录项

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号