首页> 外国专利> Device for the in situ depollution of aquifers from organic compounds in which a photoreactor is located in a dry zone created by two barrier walls and the flow of water is gravitational not pumped

Device for the in situ depollution of aquifers from organic compounds in which a photoreactor is located in a dry zone created by two barrier walls and the flow of water is gravitational not pumped

机译:用于从有机化合物中对含水层进行原位污染的设备,其中光反应器位于由两个屏障壁形成的干燥区域中,并且水流不受重力作用

摘要

A device for the depollution of aquifers contaminated by organic pollutants comprising a means of channelling the polluted ground water towards an in situ treatment zone which is below, or effectively below, the ground water level and a means of treating the water in a photoreactor located in the zone and a method of water depollution using the device. The means of channelling the ground water consists of two secure walls running from the surface to the bedrock at the base of the aquifer on either side of a gate. The gate comprises an upstream piezometer control, a downstream piezometer control and a treatment well. Both controls incorporate a silica filter body to filter the inlet water and assist the flow of outlet water into the soil. The photoreactor is implanted in a dry zone below the level of the groundwater and is of slightly smaller diameter than the treatment well. Its size is dependent on the rate of flow of the water and the degree of pollution. The presence of the walls causes a rise in the water level on the inlet side and the system operates on a gravitational basis without pumping. It is, however, disclosed that the expression 'effectively below' refers to cases when geological factors may lead to the treatment zone being located above or slightly above the water level with a consequent need for pumping.
机译:一种用于对被有机污染物污染的含水层进行污染的装置,包括将污染的地下水引向低于或有效低于地下水位的原位处理区的装置,以及处理位于该处的光反应器中的水的装置。区域和使用该设备进行水污染的方法。引导地下水的装置由两个安全壁组成,两个安全壁从表面延伸到位于闸门两侧的蓄水层底部的基岩。该闸门包括上游压力计控制,下游压力计控制和处理井。两种控制装置均具有二氧化硅过滤器主体,以过滤进水并协助出水流入土壤。将光反应器植入地下水位以下的干燥区域,其直径略小于处理井的直径。它的大小取决于水的流量和污染程度。壁的存在导致入口侧的水位上升,并且系统在无泵的情况下在重力作用下运行。但是,公开了“有效地在...下方”是指地质因素可能导致处理区位于水位以上或略高于水位并因此需要泵送的情况。

著录项

  • 公开/公告号FR2846649A1

    专利类型

  • 公开/公告日2004-05-07

    原文格式PDF

  • 申请/专利权人 ATE-GEOCLEAN;

    申请/专利号FR20020013902

  • 发明设计人 LAURENT NATACHA;RICHARD JEAN YVES;

    申请日2002-11-05

  • 分类号C02F1/32;

  • 国家 FR

  • 入库时间 2022-08-21 22:39:21

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