Application of Nano Imprint Lithography for use in micro-technology involves pressing substrates in a mould provided with a motif of hollows and projections through to a hardened polymer sub-layer

摘要

Lithography by pressing a substrate includes a preparation stage during which the substrate (1) is covered with a layer, a pressing stage in a mould provided with a motif made up of hollows and projections on only a part of the thickness of the layer, at least one stage of attack on the layer to denude some parts of the substrate surface and a stage of engraving the substrate with the mould motif. The preparation stage includes a sub-stage for the formation of a lower sub-layer (2A) of a hardenable material, a stage of hardening this sub-layer and a sub-stage for the formation of an outer sub-layer adjacent to the hardened sub-layer. The pressing stage includes the penetration of the projections of the mould into this outer sub-layer up to contact with the hardened sub-layer.