THREE-DIMENSIONAL HIGH-FREQUENCY PLASMA CVD APPARATUS AND THREE-DIMENSIONAL HIGH-FREQUENCY PLASMA CVD METHOD

摘要

PROBLEM TO BE SOLVED: To provide a new high-frequency plasma CVD method for three-dimensionally depositing a thin film uniformly at high speed on the surface of a substrate of a mechanical component made of metal or glass or plastic bottle etc.;SOLUTION: A pair of high-frequency antenna coils 5 and 5 are arranged apart from and opposite to each other within a vacuum chamber 2 into which gaseous raw materials are introduced. A plasma is generated within the vacuum chamber 2 by applying a high-frequency voltage or pulse voltage to the pair of the high-frequency antenna coils 5 and 5 and the substrate S having a three-dimensional shape on the surface is charged into the space between the pair of the high-frequency antenna coils 5 and 5 to form the deposited film on the surface of the substrate.;COPYRIGHT: (C)2005,JPO&NCIPI