首页> 外国专利> SURFACE PROTECTION FILM FORMATION METHOD FOR REPAIRING TOOL FOR HEAT TREATMENT AND REPAIRING TOOL FOR HEAT TREATMENT

SURFACE PROTECTION FILM FORMATION METHOD FOR REPAIRING TOOL FOR HEAT TREATMENT AND REPAIRING TOOL FOR HEAT TREATMENT

机译:用于热处理的工具和热处理的工具的表面保护膜形成方法

摘要

PROBLEM TO BE SOLVED: To provide the surface protection film formation method of a preparing tool for heat treatment for forming the SiC film of a plurality of layers on the surface of a repairing tool for heat treatment so as to sufficiently decrease impurity concentration in the SiC film, especially, the impurity concentration of the uppersurface layer of the SiC film.;SOLUTION: The surface protection film formation method of a repairing tool for heat treatment for forming the SiC film of a plurality of layers for protecting the surface of a repairing tool for heat treatment is characterized by forming the SiC film of the plurality of layers, using a CVD furnace different for each layer on the base material of the repairing tool for heat treatment by a CVD method, and at least by forming the SiC layer of the first layer on the base material, and then removing the surface layer of the SiC layer of the first layer before forming the SiC layer of the second layer.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种用于热处理的制备工具的表面保护膜形成方法,该方法用于在用于热处理的修复工具的表面上形成多层的SiC膜,以充分降低SiC中的杂质浓度。解决方案:用于热处理的修复工具的表面保护膜形成方法,用于形成多层保护膜,以保护修复工具的表面用于热处理的特征在于,通过使用CVD方法在用于热处理的修复工具的基材上的每一层上各不相同的CVD炉,形成多层的SiC膜,并且至少通过形成所述SiC膜来形成所述多层的SiC膜。基材上的第一层,然后在形成第二层的SiC层之前先去除第一层的SiC层的表面层。;版权所有:(C)2005,JPO &NCIPI

著录项

  • 公开/公告号JP2005197534A

    专利类型

  • 公开/公告日2005-07-21

    原文格式PDF

  • 申请/专利权人 SHIN ETSU HANDOTAI CO LTD;

    申请/专利号JP20040003461

  • 发明设计人 MIZUNO MICHIHIKO;KIMURA AKIHIRO;

    申请日2004-01-08

  • 分类号H01L21/22;H01L21/26;H01L21/324;H01L21/68;

  • 国家 JP

  • 入库时间 2022-08-21 22:33:53

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