OBSERVATION METHOD FOR ULTRAVIOLET PHOTOLYSIS PROCESS IN MONOMOLECULAR FILM, CONTROL METHOD FOR SURFACE DECOMPOSITION DEGREE, AND PATTERNING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of observing effectively a photolysis process in a monomolecular film in a real time.;SOLUTION: This method of observing the decomposition process in the monomolecular film of the present invention is a method of observing the photolysis process in the monomolecular film when the monomolecular film is irradiated with an ultraviolet ray, and measures structure of a constitutive molecule of the monomolecular film under each of ultravacuum atmosphere and oxygen existing atmosphere, during the irradiation of the ultraviolet ray, by a molecular structure measuring means. The present invention provides also a control method for a surface decomposition degree of the monomolecular film controlling an ozone concentration accompanied to the ultraviolet ray irradiation based on an observed result obtained using the observation method. The present invention provides also a patterning method for the monomolecular film using the control method.;COPYRIGHT: (C)2006,JPO&NCIPI