首页> 外国专利> METHOD AND APPARATUS FOR TREATING AQUEOUS HALOGEN COMPOUND SOLUTION, AQUEOUS ACIDIC SOLUTION OR ACIDIC GAS

METHOD AND APPARATUS FOR TREATING AQUEOUS HALOGEN COMPOUND SOLUTION, AQUEOUS ACIDIC SOLUTION OR ACIDIC GAS

机译:用于处理卤代化合物水溶液,酸性溶液或酸性气体的方法和装置

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently making an aqueous halogen compound solution, an aqueous acidic solution or an acidic gas harmless; and to provide a method for treating efficiently and an apparatus having durability.;SOLUTION: The method for treating the aqueous halogen compound solution, the aqueous acidic solution or the acidic gas comprises introducing an aqueous solution containing hydrogen chloride into a dissolution tank 30 accommodating a granular substance or a particulate substance comprising calcium hydroxide or calcium carbonate, reacting the aqueous solution in the dissolution tank 30 to convert the aqueous solution containing hydrogen chloride into an aqueous solution containing calcium chloride, introducing the aqueous halogen compound solution, or the like, into a precipitation tank 20, to which the converted aqueous solution containing the calcium chloride is fed, so as to precipitate the aqueous halogen compound solution, or the like, as respective hardly soluble calcium compounds, taking out the resulting precipitate, thereafter, introducing an aqueous solution containing hydrogen chloride in the precipitation tank 20 after precipitation into the dissolution tank 30 so as to convert the aqueous solution containing hydrogen chloride into a solution containing calcium chloride, and again circulating the solution containing calcium chloride to the precipitation tank 20.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种有效地使卤素化合物水溶液,酸性水溶液或酸性气体无害的方法。 ;解决方案:用于处理卤素化合物水溶液,酸性水溶液或酸性气体的方法包括将含有氯化氢的水溶液引入容纳有氯化氢的溶解槽30中。颗粒状物质或包含氢氧化钙或碳酸钙的颗粒状物质,在溶解槽30中使水溶液反应以将包含氯化氢的水溶液转化为包含氯化钙的水溶液,将卤素化合物水溶液等引入向沉淀槽20中加入经转化的含有氯化钙的水溶液,以沉淀作为难溶于水的钙化合物的卤素化合物水溶液等,取出所得沉淀,然后引入水含有氯化氢的溶液沉淀槽20中沉淀之后进入沉淀槽30,以将包含氯化氢的水溶液转化为包含氯化钙的溶液,并再次将包含氯化钙的溶液循环至沉淀槽20。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005145818A

    专利类型

  • 公开/公告日2005-06-09

    原文格式PDF

  • 申请/专利权人 KIN KISHUN;

    申请/专利号JP20040378748

  • 发明设计人 MINAMI WATARU;KIN KISHUN;

    申请日2004-12-28

  • 分类号C01F11/22;B01D53/68;B01D53/77;C01F11/24;C02F1/58;

  • 国家 JP

  • 入库时间 2022-08-21 22:32:20

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