METHOD OF FORMING FILM BODY HAVING MICROPORE, FILM BODY, METHOD OF FORMING MASK FOR FORMING FILM BODY HAVING MICROPORE, AND MASK FOR FORMING FILM BODY HAVING MICROPORE

摘要

PROBLEM TO BE SOLVED: To provide a new technique for easily forming a micropore having steep edges without giving damage to a substrate layer or the like.;SOLUTION: A first film body is formed via a resist pattern formed on a substrate layer, the resist pattern is then removed to form a first patterning mask. Then, the exposed part of the substrate layer is removed by etching using the first patterning mask to form a second patterning mask 17. Next, a second film body 18 is formed via the second patterning mask. Thereafter, the second patterning mask is removed to form a film body having a micropore.;COPYRIGHT: (C)2005,JPO&NCIPI