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PRETREATMENT METHOD FOR ELECTROLESS PLATING, METHOD FOR MANUFACTURING SUBSTRATE FOR MAGNETIC RECORDING MEDIA INCLUDING THE PRETREATMENT METHOD, AND SUBSTRATE FOR MAGNETIC RECORDING MEDIA MANUFACTURED BY THE MANUFACTURING METHOD
PRETREATMENT METHOD FOR ELECTROLESS PLATING, METHOD FOR MANUFACTURING SUBSTRATE FOR MAGNETIC RECORDING MEDIA INCLUDING THE PRETREATMENT METHOD, AND SUBSTRATE FOR MAGNETIC RECORDING MEDIA MANUFACTURED BY THE MANUFACTURING METHOD
PROBLEM TO BE SOLVED: To provide a pretreatment method for forming a plating film free from flaws on the surface of a plating film formed of nickel and phosphor.;SOLUTION: The pretreatment method is directed at pretreating the first plating film when forming the second plating film including (1) Ni, (2) P and/or B, and (3) arbitrary one or more elements selected among V, Cr, Mn, Fe, Co, Cu, Zn, Mo, Pd, Sn, W and Re, on the substrate having the first plating film formed of Ni and P; includes an etching step of etching the surface of the first plating film on the above substrate by an etching amount in between 1 mg/m2 and 5 mg/m2; and thereby controls an oxidized degree of nickel in the surface of the first plating film after having been etched to a value of 0.3 or less. Furthermore, the method for manufacturing the magnetic recording media including the pretreatment method and the magnetic recording media manufactured by the manufacturing method are provided.;COPYRIGHT: (C)2005,JPO&NCIPI
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机译:解决的问题:提供一种在镍和磷形成的镀膜表面上形成无缺陷的镀膜的预处理方法。解决方案:该预处理方法旨在在形成第二镀膜时对第一镀膜进行预处理膜,包括(1)Ni,(2)P和/或B,以及(3)选自V,Cr,Mn,Fe,Co,Cu,Zn,Mo,Pd,Sn,W和Re中的任意一种或多种元素在具有由Ni和P形成的第一镀膜的基板上;包括蚀刻步骤,以在1mg / m 2 Sup>至5mg / m 2 Sup>之间的蚀刻量蚀刻上述基板上的第一镀膜的表面。从而将蚀刻后的第一镀膜表面的镍的氧化度控制为0.3以下。此外,提供了一种包括预处理方法的磁记录介质的制造方法和通过该制造方法制造的磁记录介质。版权所有:(C)2005,JPO&NCIPI
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