METHOD OF PRODUCING FLUOROCARBON FILM, INDUSTRIAL MATERIAL OR INDUSTRIAL PRODUCT USING THE SAME, AND DEVICE USING THE INDUSTRIAL MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a fluorocarbon film where film deposition is possible even in a part at which the wall face can not be viewed from an inlet, and a fluorocarbon film obtained by the method has resistance to chemicals used for producing a semiconductor device, heat resistance and excellent mechanical strengths as well, and to provide an industrial material using the same.;SOLUTION: In the method of producing a fluorocarbon film, a first organic matter is stuck to the surface of a base material 7, and thereafter, a fluorinating gas is made to flow to form a fluorocarbon film on the surface of the base material.;COPYRIGHT: (C)2005,JPO&NCIPI