SUBSTRATE WITH MUTI-LAYER REFLECTIVE FILM, EXPOSURE REFLECTION TYPE MASK BLANK, EXPOSURE REFLECTION TYPE MASK, AND MANUFACTURING METHODS FOR THESE

摘要

PROBLEM TO BE SOLVED: To provide a substrate with a multi-layer reflective film for suppressing the peeling of a conductive film and the generation of a particle due to abnormal discharge when the substrate with the conductive film is electrostatically chucked, to provide a high-quality exposure reflection type mask blank where surface defects due to the particle hardly occur, and a high-quality exposure reflection type mask where there is no pattern defect due to the particle.;SOLUTION: The substrate 10 with the multi-layer reflective film has a the multi-layer reflective film 3 reflecting exposed light on the substrate 1 and the conductive film 2 formed in an area of the substrate 1 except at least its periphery on the opposite side of the substrate 1 to the multi-layer reflective film 3. The conductive film 2 is composed of a material containing e.g. chromium (Cr), and nitrogen (N) is contained in the substrate 1 side of the conductive film 2, and at least either oxygen(O) or carbon(C) is contained at the surface side of the conductive film. An absorbent film absorbing the exposed light is formed on the multi-layer reflective film 3 of the of the substrate 10 with the multi-layer reflective film, thereby, the exposure reflection type mask blank is obtained. Further, a pattern is formed on the absorbent film of the exposure reflection type mask blank, thereby, the exposure reflection type mask is obtained.;COPYRIGHT: (C)2005,JPO&NCIPI