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Its associated equipment, as well as improved product of the contaminant removal device from the gas flow and gas flow processing unit

机译:它的相关设备以及气流和气流处理单元中污染物去除装置的改进产品

摘要

I disclose a gas flow processing unit. Gas stream treatment apparatus comprising a gas inlet (18), gas outlet (20), a first passage and a second flow path. First flow passage leading to the gas outlet from the gas inlet through means (24) for at least partially removing contaminant from at least one gas stream. Second flow path leading up to the gas outlet from the gas inlet as removing means (24) other than.
机译:我公开了一种气流处理单元。气流处理设备包括气体入口(18),气体出口(20),第一通道和第二流动路径。第一流动通道从气体入口通过装置(24)通向气体出口,以至少部分地从至少一个气流中去除污染物。第二流动路径从排气口引至排气口,作为除气装置(24)以外的第二流路。

著录项

  • 公开/公告号JP2005519218A

    专利类型

  • 公开/公告日2005-06-30

    原文格式PDF

  • 申请/专利权人 パー-テック リミテッド;

    申请/专利号JP20030573275

  • 发明设计人 カクラ、ピーター;

    申请日2003-03-03

  • 分类号F01N3/02;B01D46/42;B03C3/02;B03C3/155;B03C3/40;

  • 国家 JP

  • 入库时间 2022-08-21 22:29:18

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