首页> 外国专利> HEATING/ COOLING METHOD, PROCESS FOR MANUFACTURING IMAGE DISPLAY DEVICE, HEATING/COOLING DEVICE AND HEATING/ COOLING TREATMENT DEVICE

HEATING/ COOLING METHOD, PROCESS FOR MANUFACTURING IMAGE DISPLAY DEVICE, HEATING/COOLING DEVICE AND HEATING/ COOLING TREATMENT DEVICE

机译:加热/冷却方法,制造图像显示装置的过程,加热/冷却装置以及加热/冷却治疗装置

摘要

PROBLEM TO BE SOLVED: To provide a heating/cooling method which can perform heating and cooling of a substrate at a high speed, a process for manufacturing an image display device, a heating/ cooling device and a heating/ cooling treatment device.;SOLUTION: When a substrate 3 is arranged in a chamber 6, a gas in the chamber 6 is discharged to form a reduced pressure atmosphere in the chamber 6. Subsequently, a heating element 4 generates heat to subject the substrate 3 to heating treatment. When the heating element 4 generates heat, heat directed toward a heat reflecting member 5 among the heat generated from the heating element 4 is reflected by the heat reflecting member 5 so that the reflected heat heats the substrate 3. When the heating treatment is finished, the heat reflecting member 5 moves in the direction indicated by the arrow A, and then, the heat reflecting member 5 does not exist between the heating element 4 and a cooling plate 7. In addition, the heat generation of the heating element 4 stops. Accordingly, the substrate 3 is cooled by the cooling plate 7.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种可以对基板进行高速加热和冷却的加热/冷却方法,一种图像显示装置的制造方法,一种加热/冷却装置和一种加热/冷却处理装置。 :当将基板3布置在腔室6中时,腔室6中的气体被排出以在腔室6中形成减压气氛。随后,加热元件4产生热量以对基板3进行热处理。当加热元件4产生热量时,从加热元件4产生的热量中的朝向热反射元件5的热量被热反射元件5反射,从而反射的热量加热基板3。当完成加热处理时,当热反射构件5沿箭头A所示的方向移动时,在加热元件4和冷却板7之间不存在热反射构件5。另外,加热元件4的发热停止。因此,基板3被冷却板7冷却。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005090919A

    专利类型

  • 公开/公告日2005-04-07

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP20030328290

  • 发明设计人 KAMATA SHIGETO;KIMURA AKIHIRO;

    申请日2003-09-19

  • 分类号F27B17/00;

  • 国家 JP

  • 入库时间 2022-08-21 22:29:11

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