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METHOD OF DENSIFYING FLUORIDE OPTICAL THIN FILM, AND FLUORIDE OPTICAL DEVICE

机译:氟化物光学薄膜的致密化方法及氟化物光学器件

摘要

PROBLEM TO BE SOLVED: To provide a method of densifying the structure of an optical thin film deposited on an optical element.;SOLUTION: The method of densifying the optical thin film includes: a process of loading a fluoride optical device 18 on which a fluoride optical thin film 20 is stacked into a reaction furnace 2; a process of heating and densifying the fluoride optical thin film by introducing gaseous fluorine into the reaction furnace 2; a process of cooling the fluoride optical device 18 loaded into the reaction furnace 2; and a process of taking out the fluoride optical device 18 from the reaction furnace 2. The temperature in the reaction furnace in the densification process is controlled to 200 to 400°C and the concentration of the gaseous fluorine to 10 ppm to 100%.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种使沉积在光学元件上的光学薄膜的结构致密化的方法。解决方案:使光学薄膜致密化的方法包括:将氟化物光学器件18装载在其上的过程。将光学薄膜20堆叠到反应炉2中;通过将气态氟引入反应炉2中来加热和致密化氟化物光学薄膜的过程;对装入反应炉2的氟化物光学元件18进行冷却的工序。从反应炉2中取出氟化物光学器件18。将致密化过程中反应炉中的温度控制在200至400℃,气态氟的浓度控制在10ppm至100%。版权所有(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2004347860A

    专利类型

  • 公开/公告日2004-12-09

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO KK;NIKON CORP;

    申请/专利号JP20030144825

  • 发明设计人 HOSHINO YASUYUKI;TAKI YUSUKE;

    申请日2003-05-22

  • 分类号G02B1/11;

  • 国家 JP

  • 入库时间 2022-08-21 22:28:59

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