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Xenon (Xe) with implantation for the advance amorphous conversion
Xenon (Xe) with implantation for the advance amorphous conversion
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机译:氙气(Xe)植入,可进行无定形转化
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摘要
A SOI substrate (101) is preamorphized by ion implanting Xe 15 prior to forming source/drain extensions (21) and source/drain regions (41), thereby virtually eliminating or significantly reducing floating body effects. Other aspects comprise ion implanting a Xe 2 + into a bulk silicon or SOI substrate to effect preeamorphization prior to forming source/drain extensions and regions having shallow junctions with reduced vertical and lateral straggle.
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