首页> 外国专利> METHOD OF APPLYING NICKEL PLATING TO ELECTROCONDUCTIVE FILM ON METALLIC OXIDE COMPACTED SINTERED MATTER AND NICKEL PLATING LIQUID COMPOSITION FOR ELECTRICALLY CONDUCTIVE FILM

METHOD OF APPLYING NICKEL PLATING TO ELECTROCONDUCTIVE FILM ON METALLIC OXIDE COMPACTED SINTERED MATTER AND NICKEL PLATING LIQUID COMPOSITION FOR ELECTRICALLY CONDUCTIVE FILM

机译:在金属氧化物压实烧结材料上镀镍到导电膜上的方法及用于导电膜的镀镍液体组合物

摘要

PROBLEM TO BE SOLVED: To apply nickel plating to an electroconductive film on a metallic oxide compacted sintered matter without depending on shielding treatment.;SOLUTION: When nickel plating is applied to an electroconductive film on the metallic oxide compacted sintered matter, the concentration of a nickel salt selected as the essential component of a plating liquid is held to 70 to 200 g/L, the pH of the plating liquid to 5.4 to 6.6, and the temperature of the plating liquid to 60°C±5°C, and within 2 hr, the element assembly of the metal oxide compacted fired matter is subjected to direct plating at a conducting current of 3 to 5 A.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:在不依赖屏蔽处理的情况下,在金属氧化物压实的烧结体上的导电膜上镀镍;解决方案:当在金属氧化物压实的烧结体上的导电膜上镀镍时,被选择为电镀液的必要成分的镍盐保持在70至200g / L,电镀液的pH保持在5.4至6.6,并且电镀液的温度保持在60℃至5℃,并且在2小时后,将金属氧化物压制烧成物的元件组件在3至5 A的导电电流下进行直接电镀;版权:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005002380A

    专利类型

  • 公开/公告日2005-01-06

    原文格式PDF

  • 申请/专利权人 OIZUMI SEISAKUSHO:KK;

    申请/专利号JP20030164684

  • 发明设计人 TANABE YOSHIHIRO;OKADA MASAHISA;

    申请日2003-06-10

  • 分类号C25D7/00;C25D3/12;H01G4/12;H01G4/252;

  • 国家 JP

  • 入库时间 2022-08-21 22:28:09

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