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Apparatus for measuring thickness profile and refractive index distribution of multiple layers of thin films by means of two-dimensional refrectometry and method of measuring the same
Apparatus for measuring thickness profile and refractive index distribution of multiple layers of thin films by means of two-dimensional refrectometry and method of measuring the same
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机译:通过二维折射计测量多层薄膜的厚度分布和折射率分布的装置及其测量方法
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摘要
The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by means of the principle of reflectometry. According to the present invention, by employing more than one narrow band-pass optical filters and a two-dimensional array of CCD sensors, and by finding an optimal solution for the nonlinear functional relationship between the thickness of said thin film or thin films and the corresponding refractive indexes by using an iterative numerical computation method, said apparatus simultaneously measures local area-wise thickness profile and refractive index distribution among others of said a single layer or multiple layers of thin films on a substrate.
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