首页> 外国专利> Method of patterning the surface of an article using positive microcontact printing

Method of patterning the surface of an article using positive microcontact printing

机译:使用正微接触印刷对物品表面进行图案化的方法

摘要

There is disclosed a method of patterning an article (10) including a layer (12) of copper formed onto an insulating substrate (11) using a positive microcontact printing (MCP) process. In a preferred embodiment where the metal is copper (Cu) and the substrate is a silicon wafer, the method includes removing the native oxide presents on the Cu in a solution of HCl. Then, a stamp (13′) having a patterned polydimethylsiloxane (PDMS) body (14) is linked with a 0.2 mM solution of pentaerythritol-tetrakis(3-mercaptopropionate) (PTMP) in ethanol for 1 min, to form the inking layer (15′). The stamp is applied on the Cu layer to print a first self-assembled monolayer (SAM) (16′) according to a desired pattern. The article is dipped in a solution of ECT which is then adsorbed only in the non printed regions, forming a second SAM (18) in a configuration that is complementary to the desired pattern. Finally, the printed areas of the Cu layer are removed using a peroxodisulfate etch bath.
机译:公开了一种使用包括在绝缘基板( 11 )上形成的铜层( 12 )的制品( 10 )进行构图的方法。正微接触印刷(MCP)工艺。在金属是铜(Cu)并且衬底是硅晶片的优选实施例中,该方法包括去除存在于Cu的HCl溶液中的天然氧化物。然后,将具有图案化的聚二甲基硅氧烷(PDMS)主体( 14 )的图章( 13 ')与0.2 mM季戊四醇-四(3-巯基丙酸酯)溶液(在乙醇中浸泡1分钟,形成上墨层( 15 ')。将压模施加在Cu层上,以根据所需图案印刷第一自组装单层(SAM)( 16 ')。将制品浸入ECT溶液中,然后仅吸附在非印刷区域中,以与所需图案互补的构造形成第二个SAM( 18 )。最后,使用过二硫酸盐蚀刻浴去除铜层的印刷区域。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号