首页> 外国专利> Vertical cavity surface emitting laser with buried dielectric distributed Bragg reflector

Vertical cavity surface emitting laser with buried dielectric distributed Bragg reflector

机译:具有埋入式电介质分布布拉格反射器的垂直腔面发射激光器

摘要

A vertical cavity surface-emitting laser (VCSEL) structure and related fabrication methods are described, the VCSEL comprising amorphous dielectric distributed Bragg reflectors (DBRs) while also being capable of fabrication in a single-growth process. Beginning with a substrate such as InP, a first amorphous dielectric DBR structure is deposited thereon, but is limited in width such that some substrate material remains uncovered by the dielectric material. A lateral overgrowth layer is then formed by epitaxially growing material such as InP onto the substrate, the lateral overgrowth layer eventually burying the dielectric DBR structure as well as the previously-uncovered substrate material. Active layers may then be epitaxially grown on the lateral overgrowth layer, and a top dielectric DBR may be deposited thereon using conventional techniques. To save vertical space between DBRs, the first DBR may be deposited in a non-reentrant well formed in the surface of a substrate. A dual lateral overgrowth method for further reducing dislocations above a lower buried dielectric DBR of a VCSEL is also described.
机译:描述了垂直腔表面发射激光器(VCSEL)的结构和相关的制造方法,该VCSEL包括非晶电介质分布的布拉格反射器(DBR),同时还能够以单生长工艺制造。从诸如InP的衬底开始,在其上沉积第一非晶电介质DBR结构,但是其宽度受到限制,使得一些衬底材料保持未被电介质材料覆盖。然后通过将诸如InP的材料外延生长到衬底上来形成横向过度生长层,横向过度生长层最终掩埋电介质DBR结构以及先前未被覆盖的衬底材料。然后可以在横向过生长层上外延生长有源层,并且可以使用常规技术在其上沉积顶部电介质DBR。为了节省DBR之间的垂直空间,可以将第一DBR沉积在形成于基板表面中的非凹入阱中。还描述了用于进一步减小VCSEL的下部掩埋电介质DBR上方的位错的双向横向生长方法。

著录项

  • 公开/公告号US6878958B2

    专利类型

  • 公开/公告日2005-04-12

    原文格式PDF

  • 申请/专利权人 ZUHUA ZHU;

    申请/专利号US20020106929

  • 发明设计人 ZUHUA ZHU;

    申请日2002-03-26

  • 分类号H01L29/06;H01L31/072;H01L31/109;H01L31/0328;H01L31/0336;

  • 国家 US

  • 入库时间 2022-08-21 22:21:09

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