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Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements
Apparatus and method for enabling high resolution film thickness and thickness-uniformity measurements
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机译:用于实现高分辨率薄膜厚度和厚度均匀性测量的设备和方法
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摘要
A high-resolution and high-speed film thickness and thickness uniformity measurement method is disclosed in this invention. The disclosed method includes a step a) of measuring a film thickness at a single point on the top surface of the substrate using an interferometry with a measuring light beam having a range of wavelengths. The method further includes a step b) of selecting an optimal wavelength from the range of wavelengths applied for measuring the film thickness at the single point. The method further includes a step c) of measuring reflection intensities by scanning over a plurality of points with a measuring light beam of the optimal wavelength over the top surface of the substrate. The method further includes a step d) of calculating a film thickness at the plurality of points applying the optimal-wavelength reflection intensities at the plurality of points over the top surface of the substrate.
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