High moment films with sub-monolayer nanolaminations retaining magnetic anisotropy after hard axis annealing

摘要

A film structure and deposition method for creating laminated Fe—M—N and Fe—M—O—N films which retain good anisotropy after HA annealing are provided. Interleaved layers of thin alumina laminations between the Fe—M—[O]—N layers and sublayer alumina nanolaminations within the Fe—M—[O]—N layers create stable magnetic anisotropy in the film. The magnetic anisotropy in the film survives HA annealing at hardbake resist curing conditions in wafer manufacturing processes for GMR magnetic recording heads.