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Quartz lamp for semiconductor processing reactor, sets ratio of distance between sleeve-contacting portions of filament supports in transparent sleeve and inner diameter of sleeve within prescribed range
Quartz lamp for semiconductor processing reactor, sets ratio of distance between sleeve-contacting portions of filament supports in transparent sleeve and inner diameter of sleeve within prescribed range
The lamp (12) has filament support (42) for radially spacing the filament (14) from the inner surface of the transparent sleeve (18). The filament supports include axially spaced pairs of sleeve-contacting portions (44,46). The ratio of distance (L) between the sleeve-contacting portions and inner diameter of the transparent sleeve, is in the range of 0.5-1.25. An independent claim is also included for filament support.
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