首页> 外国专利> Quartz lamp for semiconductor processing reactor, sets ratio of distance between sleeve-contacting portions of filament supports in transparent sleeve and inner diameter of sleeve within prescribed range

Quartz lamp for semiconductor processing reactor, sets ratio of distance between sleeve-contacting portions of filament supports in transparent sleeve and inner diameter of sleeve within prescribed range

机译:用于半导体加工反应器的石英灯,将透明套管中灯丝支架的套管接触部分之间的距离与套管内径的比值设置在规定范围内

摘要

The lamp (12) has filament support (42) for radially spacing the filament (14) from the inner surface of the transparent sleeve (18). The filament supports include axially spaced pairs of sleeve-contacting portions (44,46). The ratio of distance (L) between the sleeve-contacting portions and inner diameter of the transparent sleeve, is in the range of 0.5-1.25. An independent claim is also included for filament support.
机译:灯(12)具有用于将灯丝(14)与透明套筒(18)的内表面径向隔开的灯丝支撑件(42)。细丝支撑件包括成对的沿轴向隔开的成对的套筒接触部分(44,46)。套筒接触部分之间的距离(L)与透明套筒的内径之比在0.5-1.25的范围内。灯丝支撑也包括独立权利要求。

著录项

  • 公开/公告号NL1025055C2

    专利类型

  • 公开/公告日2004-11-24

    原文格式PDF

  • 申请/专利权人 ASM AMERICA INC.;

    申请/专利号NL20031025055

  • 发明设计人 MICHAEL W. HALPIN;

    申请日2003-12-18

  • 分类号H01K1/24;

  • 国家 NL

  • 入库时间 2022-08-21 22:17:12

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