METHOD OF PREDICTING AND MINIMIZING MODEL OPC DEVIATION DUE TO MIX/MATCH OF EXPOSURE TOOLS USING A CALIBRATED EIGEN DECOMPOSITION MODEL

摘要

Method Of Predicting And Minimizing Model OPC Deviation Due To Mix/Match OfExposure Tools Using A Calibrated Eigen Decomposition ModelABSTRACT A method for generating models for simulating the imaging performance of aplurality of exposure tools. The method includes the steps of: generating a calibrated model for a first exposure tool capable of estimating an image to be produced by the first exposure tool for a given photolithography process, where the calibrated model includes a first set of basis functions; generating a model of a second exposure tool capable of estimating an image to be produced by the second exposure tool for the photolithography process, where the model includes a second set of basis functions; and representing the second set of basis functions as a linear combination of the first set of basis functions so as to generate anequivalent model function corresponding to the second exposure tool, where the equivalent model function produces a simulated image corresponding to the image generated by the second exposure tool for the photolithography process.