首页> 外国专利> MATERIAL INCLUDING A LIQUID CRYSTALLINE POLYMER AND A POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) FILLER

MATERIAL INCLUDING A LIQUID CRYSTALLINE POLYMER AND A POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) FILLER

机译:包括液晶聚合物和多面体硅倍半氧烷(POSS)填充机的材料

摘要

Use of liquid crystalline polymers together with polyhedral oligomeric silsesquioxane (POSS) fillers either in place of or together with conventional fillers yields improved dielectric materials for circuits. POSS-filled systems typically exhibit lower mass densities and greater stiffness, and are capable of withstanding higher temperatures, as well as higher levels of ionizing radiation. In addition, POSS-filled polymers are capable of wetting fibers and fillers to desirably high degrees. They may also help to minimize polymerization shrinkage, lower viscosity and increase material toughness.
机译:液晶聚合物与多面体低聚倍半硅氧烷(POSS)填料一起代替常规填料或与常规填料一起使用可产生改进的电路介电材料。 POSS填充系统通常具有较低的质量密度和较高的刚度,并且能够承受较高的温度以及较高水平的电离辐射。另外,POSS-填充的聚合物能够将纤维和填料润湿至期望的高度。它们还可以帮助最小化聚合收缩,降低粘度并增加材料韧性。

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