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METHOD FOR CHECKING A SURFACE TO BE ANALYSED AND SCANNING SURFACE-ANALYSER

机译:检查要分析的表面和扫描表面分析仪的方法

摘要

The present invention pertains to the construction of optical instruments and relates to a method for checking a surface to be analysed as well as to a scanning analyser for detecting defects on a surface. The method involves rotating an object comprising a surface to be analysed about a first rotation axis, generating a light spot on the surface to be analysed, separately receiving the light reflected by a mirror and scattered by the surface to be analysed at the incidence point thereon of said light spot, analysing the signals thus obtained and detecting surface defects. This method can be implemented using an analyser that displaces the light spot relative to the rotating surface to be analysed along an arc and about a second rotation axis which is located outside the limits of the surface to be analysed. The device further determines the occurrence of defects on the surfaces of plates by measuring the value of the scattered light. This invention can be used for checking semiconductor plates and, due to the reduced dimensions and lower cost of the measuring apparatus, enables the integration of said apparatus in industrial equipment used in the electronic industry.
机译:本发明涉及光学仪器的构造,并且涉及一种用于检查待分析表面的方法以及一种用于检测表面上的缺陷的扫描分析仪。该方法包括使包括待分析表面的物体绕第一旋转轴旋转,在待分析表面上产生光斑,分别接收由镜子反射并由待分析表面在入射点上散射的光。对所述光斑进行分析,分析由此获得的信号并检测表面缺陷。该方法可以使用分析仪来实现,该分析仪使光斑相对于要分析的旋转表面沿弧线绕第二旋转轴移动,该第二旋转轴位于要分析的表面的界限之外。该装置还通过测量散射光的值来确定板表面上缺陷的发生。本发明可用于检查半导体板,并且由于减小了尺寸和降低了测量设备的成本,使得所述设备能够集成到电子工业中使用的工业设备中。

著录项

  • 公开/公告号EP1156321B1

    专利类型

  • 公开/公告日2004-12-22

    原文格式PDF

  • 申请/专利权人 ASM INT;

    申请/专利号EP19990973123

  • 发明设计人 ASM INTERNATIONAL N.V.;

    申请日1999-09-08

  • 分类号G01N21/88;G01N21/95;

  • 国家 EP

  • 入库时间 2022-08-21 22:11:57

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