Method for ECR plasma deposition of carbon layers which provide electron emission under the effect of an applied electric field

摘要

Plasma deposition at electronic cyclotronic resonance of electrically conducting layers of electron emitting carbon layer. Microwave power is generated in a plasma chamber comprising an electronic cyclotronic resonance area (9), ionization of a gaseous mixture is produced under a low pressure of 10-4-10-3 mbars, the created ions and electrons diffuse along magnetic field lines (6) to a substrate. Plasma deposition at electronic cyclotronic resonance of electrically conducting layers of electron emitting carbon layer. Microwave power is generated in a plasma chamber comprising an electronic cyclotronic resonance area (9), ionization of a gaseous mixture is produced under a low pressure of 10-4-10-3 mbars, the created ions and electrons diffuse along magnetic field lines (6) to a substrate (3), the gaseous mixture comprises organic molecules and hydrogen molecules, and comprises: (a) heating the substrate (3); (b) creating a plasma from the ionized gaseous mixture for a value of the magnetic field corresponding to the cyclotronic electronic resonance of organic molecules; (c) creating a positive potential difference between the plasma and the substrate, a positive or null polarization being applied to the substrate; and (d) diffusing the plasma to the substrate (3), the substrate is at a temperature to have a deposit of electron emitting material. An Independent claim is also included for a process as above for forming flat screens of large dimensions.