首页> 外国专利> PROCESS FOR THE REMOVAL OF SULFURIC ACID PRESENT IN ESSENTIALLY ALCOHOLIC SOLUTIONS OF H202 COMING FROM DIRECT SYSTHESIS

PROCESS FOR THE REMOVAL OF SULFURIC ACID PRESENT IN ESSENTIALLY ALCOHOLIC SOLUTIONS OF H202 COMING FROM DIRECT SYSTHESIS

机译:直接合成去除H2O2基本醇溶液中存在的硫酸的方法

摘要

Process for the removal of impurities, in particular sulfu­ric acid, present in solutions of H2O2 coming from direct synthesis starting from hydrogen and oxygen, fed from a re­actor containing a palladium and platinum catalyst, in an alcohol-based liquid reaction medium containing sulfuric acid and a halogen as promoters, which comprises: a) adding to the solution of H2O2 an at least stoichiomet­ric quantity with respect to the sulfuric acid present, of carbonates and/or bicarbonates and/or oxides and/or hydrox­ ides of alkaline and/or alkaline earth metals; b) removing the solid precipitated from the liquid phase.
机译:除去存在于氢气和氧气的醇基液体反应介质中的杂质的方法,该杂质存在于由氢气和氧气直接合成的H2O2溶液中,该溶液由含钯和铂催化剂的反应器进料,直接由氢和氧合成作为促进剂的卤素,包括:a)向H2O2溶液中添加相对于存在的硫酸至少化学计量的碱金属和/或碱金属的碳酸盐和/或碳酸氢盐和/或氧化物和/或羟基氧化物土金属; b)从液相中除去沉淀的固体。

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