首页> 外国专利> SHADOW-MASK MADE BY ELECTRO-FORMING MASTER OF SHADOW-MASK HAVING A PIN PORTION, AND THE MANUFACTURING METHOD OF SHADOW-MASK

SHADOW-MASK MADE BY ELECTRO-FORMING MASTER OF SHADOW-MASK HAVING A PIN PORTION, AND THE MANUFACTURING METHOD OF SHADOW-MASK

机译:具有销钉部分的荫罩电子成型模板制成的荫罩及其制造方法

摘要

Disclosed is a shadow mask, capable of being repeatedly produced using an electro-forming master through an electro-forming process, and a method of manufacturing the same. The electro-forming master used for manufacturing the shadow mask includes an electrode base having an insulating part and a current-carrying part, and a plurality of metal layers formed on the current-carrying part of the electrode base through an electro-forming process and a plurality of exposure layers formed on the insulating part of the electrode base, each of which increases in height in a sequentially layering manner, in which the exposure layers are removed from the electrode base to form a depression part when the metal layers and the exposure layers reach predetermined heights, whereby the depression part is filled with an insulating material and the metal layers are removed from the electrode base, to form an insulating layer having a predetermined height.
机译:公开了一种荫罩及其制造方法,该荫罩能够利用电形成原版通过电形成工艺重复地制造。用于制造荫罩的电形成原版包括:具有绝缘部分和载流部分的电极基座;以及通过电形成工艺在电极基座的载流部分上形成的多个金属层,并且形成在电极基体的绝缘部分上的多个曝光层,每个曝光层的高度以依次层叠的方式增加,其中当金属层和曝光时,从电极基体上去除曝光层以形成凹陷部分层达到预定高度,从而凹陷部分填充有绝缘材料,并且金属层从电极基体上去除,以形成具有预定高度的绝缘层。

著录项

  • 公开/公告号WO2005076307A1

    专利类型

  • 公开/公告日2005-08-18

    原文格式PDF

  • 申请/专利权人 GRAPHION TECHNOLOGIES USA LLC;KIM JEONG-SIK;

    申请/专利号WO2004KR00240

  • 发明设计人 KIM JEONG-SIK;

    申请日2004-02-07

  • 分类号H01J9/02;

  • 国家 WO

  • 入库时间 2022-08-21 22:09:06

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