SUBSTRATE FOR PATTERNING THIN FILM, DEVICE, METHOD FOR MANUFACTURING DEVICE, METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, ELECTROOPTIC DEVICE, AND ELECTRONIC EQUIPMENT, PARTICULARLY REGARDING TO REALIZING THINNING BY RELIABLY WETTING GROOVE BY DROPLET

摘要

PURPOSE: A substrate for patterning a thin film, a device, a method for manufacturing a device, a method for manufacturing an active matrix substrate, an electrooptic device, and an electronic equipment are provided to realize thinning of a wire pattern by reliably wetting a groove by a droplet. CONSTITUTION: A substrate(P) has a pattern formed by a discharged functional solution. The functional solution is applied on an area. Banks(B) are formed surrounding the area. A difference between a contact angle of the functional solution to the area and a contact angle of the functional solution to the banks is more than 40 deg. The functional solution reliably enters into the area between the banks by fluidity of the functional solution or capillarity even if a part of the discharged functional solution is put on the banks.