CVD APPARATUS FOR PREVENTING A BREAKAGE OF A CERAMIC GUIDE DUE TO THE REPEAT OF THERMAL EXPANSION AND THERMAL SHRINK WHILE THE CHAMBER FOR CVD PROCESS IS COOLED DOWN AND HEATED UP REPEATEDLY

摘要

PURPOSE: A CVD(Chemical Vapor Deposition) apparatus is provided to prevent a breakage of a ceramic guide due to the repeat of thermal expansion and thermal shrink while the chamber for CVD process is cooled down and heated up repeatedly by using ceramic guide segments. CONSTITUTION: A CVD apparatus comprises a processing chamber, a substrate support unit for loading a substrate in the processing chamber, a diffuser(70) with a plurality of injection holes(70a) in the processing chamber, and a gas injection pipe for injecting a gas in the chamber through the injection holes. The CVD apparatus further comprises a ceramic guide unit(5) for connecting the chamber and the diffuser. The ceramic guide unit is made up of not single ceramic bar but a plurality of ceramic guide segments(5a), thereby reducing crack due to thermal transformation.