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RADIATION SENSITIVE REFRACTIVE INDEX CHANGING COMPOSITION, PATTERN FORMING METHOD AND OPTICAL MATERIAL FOR USE IN PHOTOELECTRIC AND DISPLAY FIELDS
RADIATION SENSITIVE REFRACTIVE INDEX CHANGING COMPOSITION, PATTERN FORMING METHOD AND OPTICAL MATERIAL FOR USE IN PHOTOELECTRIC AND DISPLAY FIELDS
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机译:光电场和显示场中辐射敏感折射率的变化组成,图案形成方法和光学材料
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摘要
PURPOSE: A refractive index pattern and optical material are provided, which are obtained by changing refractive index of the material. Difference between the changed refractive indexes is sufficiently great and the refractive index pattern is stable regardless of use condition. CONSTITUTION: A refractive index pattern and optical material are obtained by a radiation sensitive refractive index changing composition that includes inorganic oxide particles, a polymerized compound, a radiation sensitive decomposer, and an escapable compound. A method for forming the refractive index pattern includes irradiating some of the radiation sensitive refractive index changing composition. The refractive index pattern means a refractive index distribution material having different areas.
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