INCLINED EXPOSING DEVICE AND INCLINED EXPOSING METHOD CAPABLE OF FORMING PATTERNS HAVING VARIOUS INCLINED STRUCTURE SHAPES

摘要

PURPOSE: An inclined exposing device and an inclined exposing method are provided to transfer vertically and simultaneously and rotate a substrate and a mask to a light source, thereby capable of forming patterns having various inclined structure shapes. CONSTITUTION: A substrate coated with photoresist is mounted to a substrate stage(52). A mask stage(54) for mounting a mask is installed to a side of the substrate stage. A scan stage(56) is connected and mounted to the substrate stage and the mask stage, moves vertically and simultaneously rotates the substrate and mask stages. The scan stage comprises a vertical movement stage for moving vertically the substrate and mask stages against the light source. A rotation stage is rotatably mounted to a base(B) in order to be integrally formed to a lower portion of the vertical movement stage and rotates the vertical movement stage against the light source.