首页> 外国专利> APPARATUS AND METHOD FOR DEPOSITING LARGE AREA MAGNESIUM OXIDE THIN FILM AT IMPROVED FILM FORMATION SPEED

APPARATUS AND METHOD FOR DEPOSITING LARGE AREA MAGNESIUM OXIDE THIN FILM AT IMPROVED FILM FORMATION SPEED

机译:在改进的成膜速度下沉积大面积氧化镁薄膜的设备和方法

摘要

PURPOSE: An apparatus and a method are provided to achieve improved film formation speed, and operate a power supply system in a stable manner without an interference by arranging magnesium targets in parallel with each other. CONSTITUTION: A method comprises a step of applying voltage to each of magnesium targets(11); a step of applying a power having a negative polar square wave with no interference of waveform by applying current to the respective magnesium targets when rise of the voltage stops; and a step of forming a magnesium oxide thin film on a substrate(41) by permitting the magnesium targets to emit magnesium particles when the power is applied.
机译:目的:提供一种装置和方法,以实现提高的成膜速度,并且通过将镁靶彼此平行布置,以稳定的方式操作电源系统而不会产生干扰。组成:一种方法包括向镁靶中的每一个施加电压的步骤(11);当电压上升停止时,通过向各个镁靶施加电流,来施加具有负方波且无波形干扰的功率的步骤;通过在通电时使镁靶放射出镁粒子,从而在基板(41)上形成氧化镁薄膜的步骤。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号