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APPARATUS AND METHOD FOR DEPOSITING LARGE AREA MAGNESIUM OXIDE THIN FILM AT IMPROVED FILM FORMATION SPEED
APPARATUS AND METHOD FOR DEPOSITING LARGE AREA MAGNESIUM OXIDE THIN FILM AT IMPROVED FILM FORMATION SPEED
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机译:在改进的成膜速度下沉积大面积氧化镁薄膜的设备和方法
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摘要
PURPOSE: An apparatus and a method are provided to achieve improved film formation speed, and operate a power supply system in a stable manner without an interference by arranging magnesium targets in parallel with each other. CONSTITUTION: A method comprises a step of applying voltage to each of magnesium targets(11); a step of applying a power having a negative polar square wave with no interference of waveform by applying current to the respective magnesium targets when rise of the voltage stops; and a step of forming a magnesium oxide thin film on a substrate(41) by permitting the magnesium targets to emit magnesium particles when the power is applied.
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