EXPOSURE HEAD COMPRISING SPACIAL LIGHT MODULATION DEVICE, FIRST MICRO-FOCUSED DEVICE ARRAY, IRIS ARRAY AND SECOND MICRO-FOCUSED DEVICE ARRAY

摘要

PURPOSE: Provided is an exposure head to reduce cross torque light or scattered light effectively and to control the beam diameter of a beam spot projected on an exposure plane through an iris array into a certain size. CONSTITUTION: The exposure head moves relatively to an exposure plane according to the irradiation direction to 2D expose the exposure plane by a bundle of light beams arranged along the lateral direction crossing the irradiation direction. The exposure head comprises a spatial light modulation device where a plurality of pixel parts whose light modulation state is changed according to the control signal are arranged one-dimensionally or two-dimensionally and which divides the light beam into a plurality of pixel beams by the plurality of pixel parts and modulates the plurality of pixel beams into any one an exposed state or an unexposed state; a first micro focused device array where first micro focused devices are arranged so as to correspond to the plurality of pixel parts; an iris array which is located at the surroundings of the rear focus plate of the first micro focused device and where a plurality of irises corresponding to the plurality of the first micro focused devices and transmitting only the main part of the circular diffraction phase; and a second micro focused device array where second micro focused devices are arranged so as to correspond to the plurality of irises and which forms a real image of the pixel beams transmitting the irises on the exposure plane.