首页>
外国专利>
V-SHAPED GROOVE STRUCTURE OF SILICA HYBRID PLATFORM FOR PREVENTING GENERATION OF UNDER-CUT PHENOMENON BY FORMING ETCHING MASK HAVING MINIMUM LINE WIDTH BETWEEN V-SHAPED GROOVE AND AUXILIARY V-SHAPED GROOVE
V-SHAPED GROOVE STRUCTURE OF SILICA HYBRID PLATFORM FOR PREVENTING GENERATION OF UNDER-CUT PHENOMENON BY FORMING ETCHING MASK HAVING MINIMUM LINE WIDTH BETWEEN V-SHAPED GROOVE AND AUXILIARY V-SHAPED GROOVE
PURPOSE: A V-shaped groove structure of a silica hybrid platform is provided to remove an undercut phenomenon which obstructs an optical fiber packaging by separating an etching mask based on a minimum line width between the V-shaped groove and an auxiliary V-shaped groove. CONSTITUTION: A hybrid platform(10) includes a V-shaped groove(20) for connecting an optical waveguide(11) to an optical fiber. The V-shaped groove corresponds to the optical waveguide. An auxiliary V-shaped grooves(30,31) are formed in a predetermined interval on both sides of the V-shaped groove. An etching mask is easily separated in a final process by a minimum line width between the V-shaped groove and the auxiliary V-shaped grooves. A depth and a line width of the auxiliary V-shaped grooves are smaller than a depth and a line width of the V-shaped groove.
展开▼