NANO-IMPRINT METHOD AND POLYMER COMPOSITION USED THEREFOR TO PROVIDE MASS PRODUCTION OF NANO PATTERNS WITH HIGH YIELD, THROUGH SIMPLE AND ECONOMIC PROCESS

摘要

PURPOSE: A nano-imprint method and a polymer composition used therefor are provided to achieve instant hardening of patterns under the conditions of low temperature and low pressure by using a thermal acid generator, an acid amplifier, accordingly to make the mass production of fine nano patterns with high yield possible, through a convenient and economic process, without using n expensive device. CONSTITUTION: The polymer composition used for nano-imprint comprises 5-20wt% of a thermal acid generator, 5-15wt% of a pressure sensitive acid generating microcapsule and 10-30wt% of an acid amplifier, based on 100wt% of a base composition, which is epoxy, vinyl or lactone. The nano-imprint method comprises: subsequently forming a metal film or silicon dioxide film(110a) and a polymer film(120a) on a substrate(100); transferring patterns by applying pressure onto the polymer film with a master(130); chemically hardening the polymer film by heat or pressure; removing the master from the hardened polymer film and removing the residual layer of the patterned polymer film(120b); carrying out dry etching of the metal film or silicon dioxide film by using the patterned polymer film as a mask for etching; and removing the patterned polymer film and forming metal grid pattern(110b).