TECHNOLOGY FOR CONTROLLING TEMPERATURE OF CANISTER FOR CHEMICAL VAPOR DEPOSITION SYSTEM CAPABLE OF EASILY ACHIEVING THERMAL EQUILIBRIUM

摘要

Purpose: the technology of a temperature for controlling the tank for a chemical gas-phase deposition system is provided to the supercooling easily realized through the thermal balance or organic compound in a vessel that reduce by an overheat. Construction: the technology of a temperature for controlling the tank for a chemical gas-phase deposition system includes the thermometer being arranged near a heat source in a container surroundings, in order to accurately control temperature, it is used to generate a steam from the organic compound for a chemical vapor deposition. The neutron moisture meter for being arranged in a center of container accurately measures the temperature of a reactant. Replacement is reduced to low level more horizontal than a sensing by an overheat or a caused temperature of supercooling.