METHOD FOR MANUFACTURING IMAGE SENSOR TO CONTROL DEPTH OF FOCUS USING DIFFERENT ETCH RATE ACCORDING TO PATTERN SIZE

摘要

Purpose: a kind of method is provided to easily control DOF (depth of focus) by one top interlayer dielectric of etching for manufacturing an image sensor to form a concave shape. Construction: a photodiode (102) is formed in a substrate (100). Multiple metal lines and multiple layer insulations alternately form in composite structure. Top interlayer dielectric (122) is etched away to sort according to pattern by using different etch ratio one concave shape of formation. One nitride layer, white layer (118) is formed in top interlayer dielectric. A metal line (126) and a passivation layer (128) are sequentially formed on nitride layer, white layer. Then, a condensation portion (130) is formed in passivation layer.