METHOD FOR DISPENSING A DEVELOPER SOLUTION USING DOUBLE SLIT NOZZLES TO CUT THE TIME FOR REQUIRED FOR DISPENSING DEVELOPER SOLUTION IN HALF

摘要

PURPOSE: A method for dispensing a developer solution using double slit nozzles is provided to cut the time required for dispensing developer solution in half, thereby reducing the dispense time and enhancing CD(Critical Dimension) uniformity of a pattern formed by chemical solution dispensing. CONSTITUTION: An organic thin film is coated on a substrate(31), and then, the organic thin film is selectively exposed for a predetermined pattern. Double slit nozzles(33) for dispensing developer solution are situated over both edges of the substrate comprising the organic thin film. A developer solution(35) is dispensed on the organic thin film using the double slit nozzles, which moving at a direction(39) from both edges to a central portion of the substrate. And then, the developer solution is cleaned to form the predetermined pattern of the organic thin film after puddle of the developer solution.