PURIFICATION APPARATUS FOR PYROLYZING HARMFUL GAS EXHAUSTED FROM SEMICONDUCTOR MANUFACTURING PROCESS USING COMBUSTION EXHAUST GAS OR FLAME OBTAINED BY BURNING FUEL, THEREBY PURIFYING HARMFUL GAS

摘要

PURPOSE: To provide a harmful gas purification apparatus capable of suppressing decomposition ratio drop of harmful gas to be treated and deposition of powder materials on the wall surface of decomposition chamber and safely and stably purifying the harmful gas over a long period of time without use of a large or complicated structure. CONSTITUTION: An apparatus for purification of harmful gas comprises: at least a harmful gas pyrolysis chamber(1); a nozzle(2) for introducing combustion exhaust gas or flame(7) into the pyrolysis chamber; a nozzle(3) for introducing harmful gas into the pyrolysis chamber; a means for introducing oxygen-containing gas into the pyrolysis chamber from the side through an air-permeable adiabatic wall; and an outlet(17) for exhausting pyrolyzed gas into the outside after pyrolyzing gas, wherein the means for introducing oxygen-containing gas into the pyrolysis chamber from the side through a air-permeable adiabatic wall(5) comprises oxygen-containing gas inlets(4) and an oxygen-containing gas channel(6), the oxygen-containing gas channel installed all over the outer circumference of the air-permeable adiabatic wall, wherein the nozzle for introducing harmful gas into the pyrolysis chamber is installed on the outer circumference of the nozzle for introducing combustion exhaust gas or flame into the pyrolysis chamber, and wherein the apparatus further comprises a powder material removal part and/or an acidic gas removal part installed at the output side of the pyrolysis chamber.