首页>
外国专利>
METHOD OF PREDICTING AND MINIMIZING MODEL OPC DEVIATION DUE TO MIX/MATCH OF EXPOSURE TOOLS USING A CALIBRATED EIGEN DECOMPOSITION MODEL
METHOD OF PREDICTING AND MINIMIZING MODEL OPC DEVIATION DUE TO MIX/MATCH OF EXPOSURE TOOLS USING A CALIBRATED EIGEN DECOMPOSITION MODEL
展开▼
机译:使用校正的本征分解模型预测和最小化模型的OPC偏差,因为混合/混合的曝光工具
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method for generating models for simulating the imaging performance of a plurality of exposure tools. The method includes the steps of: generating a calibrated model for a first exposure tool capable of estimating an image to be produced by the first exposure tool for a given photolithography process, where the calibrated model includes a first set of basis functions; generating a model of a second exposure tool capable of estimating an image to be produced by the second exposure tool for the photolithography process, where the model includes a second set of basis functions; and representing the second set of basis functions as a linear combination of the first set of basis functions so as to generate an equivalent model function corresponding to the second exposure tool, where the equivalent model function produces a simulated image corresponding to the image generated by the second exposure tool for the photolithography process.
展开▼