Fluorosilicon Network Polymer Insulating Coating Thereof and Electronic Devices Coated Therewith

摘要

The present invention relates to a fluorinated silicon network polymer prepared by the reaction of tetrahalogenated silane of formula (1) with an organic halide of formula (2), an insulating coating thereof, a coated semiconductor device and a method of producing the same.;Formula (1);SiX ₄;Formula 2;RZ;(Wherein R is an alkyl group or aromatic group containing at least one fluorine, X is bromine, iodine, chlorine, Z is bromine, iodine, chlorine, and X and Z may be different from each other)