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Processing System, Upper Electrode Unit and Method of Use of an Upper Electrode, and Electrode Unit and Method of Manufacturing the Electrode unit
Processing System, Upper Electrode Unit and Method of Use of an Upper Electrode, and Electrode Unit and Method of Manufacturing the Electrode unit
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机译:处理系统,上电极单元和上电极的使用方法,电极单元和电极单元的制造方法
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摘要
A processing system is provided with insulating members capable of easily fitted in, removed from and positioned in gas discharge holes, respectively. An etching system (100) is provided with an upper electrode (128) provided with gas discharge holes (128a) of a shape corresponding to the external shape of insulating members (144). The insulating members (144) are formed of a poly(ether ether ketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating member 144 is provided in its outer surface with a step (144a). The length of the insulating members (144) is shorter than that of the gas discharge holes (128a). Each insulating member (144) is provided with a longitudinal through hole (144d), and an end part of the through hole (144d) on the side of a processing chamber (102) is tapered so as to expand toward the processing chamber (102). The insulating members (144) are pressed in the gas discharge holes (128a) from the side of the outlet ends of the gas discharge holes (128a) so as to bring the steps (144a) into contact with shoulders (128b) formed in the sidewalls of the gas discharge holes (128a). A part of each insulating member (144) as fitted in the gas discharge hole (128a) project from a surface of the upper electrode (128) facing a susceptor (110). IMAGE
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