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Processing System, Upper Electrode Unit and Method of Use of an Upper Electrode, and Electrode Unit and Method of Manufacturing the Electrode unit

机译:处理系统,上电极单元和上电极的使用方法,电极单元和电极单元的制造方法

摘要

A processing system is provided with insulating members capable of easily fitted in, removed from and positioned in gas discharge holes, respectively. An etching system (100) is provided with an upper electrode (128) provided with gas discharge holes (128a) of a shape corresponding to the external shape of insulating members (144). The insulating members (144) are formed of a poly(ether ether ketone) resin, a polyimide resin, a poly(ether imide) resin or the like. Each insulating member 144 is provided in its outer surface with a step (144a). The length of the insulating members (144) is shorter than that of the gas discharge holes (128a). Each insulating member (144) is provided with a longitudinal through hole (144d), and an end part of the through hole (144d) on the side of a processing chamber (102) is tapered so as to expand toward the processing chamber (102). The insulating members (144) are pressed in the gas discharge holes (128a) from the side of the outlet ends of the gas discharge holes (128a) so as to bring the steps (144a) into contact with shoulders (128b) formed in the sidewalls of the gas discharge holes (128a). A part of each insulating member (144) as fitted in the gas discharge hole (128a) project from a surface of the upper electrode (128) facing a susceptor (110). IMAGE
机译:处理系统设有绝缘构件,该绝缘构件能够分别容易地装配在排气孔中,从排气孔中拆卸和定位在排气孔中。蚀刻系统(100)具备上部电极(128),该上部电极(128)具有与绝缘构件(144)的外形对应的形状的气体排出孔(128a)。绝缘构件(144)由聚(醚醚酮)树脂,聚酰亚胺树脂,聚(醚酰亚胺)树脂等形成。每个绝缘构件144在其外表面上均设有台阶(144a)。绝缘构件(144)的长度比气体排出孔(128a)的长度短。每个绝缘构件(144)设置有纵向通孔(144d),并且通孔(144d)的在处理腔室(102)侧的端部逐渐变细,从而朝向处理腔室(102)扩展。 )。绝缘构件(144)从排气孔(128a)的出口端侧压入排气孔(128a),以使台阶(144a)与形成在台阶(128)中的肩部(128b)接触。排气孔(128a)的侧壁。每个绝缘构件(144)的装配在气体排放孔(128a)中的一部分从上电极(128)的面对基座(110)的表面突出。 <图像>

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