Photoresist composition for Top-surface Imaging Process by Silylation

摘要

When the present invention relates to a TIPS (Top-Surface Imaging Process by Silylation) TIPS process using the photoresist composition, and the composition, by using the photoresist composition of the present invention comprises the amino acid as an additive do the TIPS process, the exposure area when the acid is generated in the entering into the non-exposed areas to serve to the amino acid added to the photoresist composition to hold the acid improves the exposed area and the unexposed regions daejobi of by the small amount of acid on moving in an exposure area in the conventional method the chamber relation (silylation) area can be greatly reduced LER (line edge roughness) produced in the department As dry developing process.