TRANSPARENT SUBSTRATE PROVIDED WITH AT LEAST ONE THIN LAVER BASED ON SILICON NITRIDE OR OXYNITRIDE AND THE PROCESS FOR OBTANING IT AND THE MANUFACTURING PROCESS OF GLAZING ASSEMBLIES USING THE SUBSTRATE

摘要

A transparent glass substrate (1) is coated with a silicon nitride-based or oxynitride-based thin film (2) which contains 30-60 (preferably 40-50) at.% Si, 10-56 (preferably 20-56) at.% N, 1-40 (preferably 5-30) at.% O and 1-40 (preferably 5-30) at.% C. Also claimed is a process for depositing the above thin film (2) by CVD from a silicon precursor (preferably a silane and/or silazane) and a nitrogen precursor, the nitrogen precursor being in the form of an amine, preferably a 1-6C alkyl prim., sec. or tert. amine, especially ethylamine, methylamine, dimethylamine, butylamine or propylamine.