首页> 外国专利> Process for removing material in the structuring of a thin layer semiconductor component used for photovoltaic cells comprises directing laser beam having selected pulse duration and wavelength on the layer side of the component

Process for removing material in the structuring of a thin layer semiconductor component used for photovoltaic cells comprises directing laser beam having selected pulse duration and wavelength on the layer side of the component

机译:在构造用于光伏电池的薄半导体组件中去除材料的方法包括将具有选定脉冲持续时间和波长的激光束引导到组件的层侧

摘要

Process for removing material in the structuring of a thin layer semiconductor component comprises directing a laser beam having a selected pulse duration and wavelength on the layer side of the component in a gas atmosphere under reduced pressure or in an inert gas. The pulse duration, wavelength and energy density distribution of the laser beam are adjusted, so that the material of the substrate lying next to the material to be removed experiences no function-impairing damage. An independent claim is also included for a thin layer semiconductor material produced by the above method.
机译:在薄层半导体部件的结构中去除材料的方法包括:在减压的气体气氛中或在惰性气体中,将具有选定的脉冲持续时间和波长的激光束引导到部件的层侧。调节激光束的脉冲持续时间,波长和能量密度分布,从而使与要去除的材料相邻的衬底材料不会受到功能损害。对于通过上述方法制造的薄层半导体材料也包括独立权利要求。

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