首页> 外国专利> Laminar and abrasive machining device for e.g. crystalline silicon wafer, has supporting device with surface bearing and bearing supports supporting rear side of work disk which is pressed against carrier`s front with work piece

Laminar and abrasive machining device for e.g. crystalline silicon wafer, has supporting device with surface bearing and bearing supports supporting rear side of work disk which is pressed against carrier`s front with work piece

机译:层流和磨料加工设备,例如晶体硅晶片,具有带表面轴承的支撑装置和轴承支撑,支撑支撑工作盘的后侧,该工作盘的后侧用工件压在支架的前部

摘要

The device has a work piece carrier (2) supported by a press stamp that is supported in such a way that the carrier and a work piece on the carrier are pressed against the front side of a work disk (5). A supporting device has a surface bearing (6) and bearing supports (8) supporting the rear side of the work disk which is pressed against on the front of the carriers with the work piece.
机译:该装置具有由压模支撑的工件承载器(2),该压模以如下方式支撑:将承载器和承载器上的工件压向工作盘(5)的前侧。支撑装置具有表面轴承(6)和支撑工作盘的后侧的轴承支撑(8),该工作盘的后侧与工件一起被压在托架的前部。

著录项

  • 公开/公告号DE102004017452A1

    专利类型

  • 公开/公告日2005-11-03

    原文格式PDF

  • 申请/专利权人 SILTRONIC AG;

    申请/专利号DE20041017452

  • 发明设计人 DESER JOHANN;KOECKEIS RUPERT;

    申请日2004-04-08

  • 分类号B24B7/04;B24B7/22;B24B37/04;H01L21/304;

  • 国家 DE

  • 入库时间 2022-08-21 22:00:45

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