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Target arrangement for sputtering processes comprises a cylindrical support element and a hollow cylindrical target made from target material
Target arrangement for sputtering processes comprises a cylindrical support element and a hollow cylindrical target made from target material
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机译:用于溅射工艺的靶装置包括圆柱形支撑元件和由靶材料制成的空心圆柱形靶
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摘要
Target arrangement (10) comprises a cylindrical support element (12) and a hollow cylindrical target (22) made from target material. The target surrounding the support element in sections is held at a distance to the support element by a clamping ring (20) arranged between the support element and the target and is fixed by the clamping ring to the support element using a clamping seat.
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