A mask is formed on the surface of the electro-optical material, using photolithography. The grating is then formed by effecting a proton exchange through the mask, defining regions having different refractive indices. The process for manufacture of a Bragg grating on a wave guide uses an electro-optical material. A mask is formed on the surface of the electro-optical material, and the grating is formed by effecting a proton exchange through the mask. The mask may be formed by a process of photolithography. The waveguide itself is formed by diffusion of an element into the electro-optic material, which may be lithium niobate or lithium tantalite. The element used for diffusion is titanium, whilst the proton exchange is carried out in a bath of pure benzoic acid. The final grating is produced by means of a sequence of zones of electro-optic material having different refractive indices.
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